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High-Performance Polymethylpentene Nonwoven|Durable, Insulating Material for Industrial Use
Technology / product information
PMP nonwoven fabric with heat resistance (~230°C), chemical durability, and electrical insulation. Lightweight and reliable for electronics, filtration, and chemical processing.
Polymethylpentene (PMP) Nonwoven Fabric
Polymethylpentene (PMP) nonwoven fabric is a polyolefin-based high-performance material designed for demanding industrial environments. With a unique balance of thermal stability, chemical resistance, and dielectric strength, it is ideal for electronics, filtration, and chemical processing applications.
Key Features
- High Heat Resistance
Maintains mechanical integrity and functional performance at temperatures up to ~230°C.
- Chemical Resistance
Withstands exposure to corrosive agents and aggressive chemicals without degradation.
- Electrical Insulation
Provides reliable dielectric properties, ensuring safety in electronic and high-voltage systems.
- Lightweight Design
Reduces system weight while maintaining strength and precision performance.
Technical Specifications
- Main Material: Polymethylpentene (PMP)
- Melting Point: ~230°C
- Electrical Insulation: High-performance dielectric capability
- Customization: Thickness, dimensions, and formats tailored to customer requirements
Applications
- Electronic Insulation
Applied as dielectric layers in high-voltage or sensitive electronic systems.
- High-Temperature Filtration
Suitable for filters operating in extreme thermal environments.
- Chemical Processing
Functions as protective barrier material against chemical exposure in industrial operations.
Why It Matters
Industries require advanced nonwoven materials that combine heat resistance, chemical durability, and lightweight design. Tapyrus’s PMP nonwoven fabric delivers reliability and safety across multiple demanding fields, making it a trusted choice for engineers and manufacturers seeking long-term performance.
※ For more details, please contact us below or download the document for further information.
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